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Product Details for STS Multiplex ICP ASE

Category: ICP-MS
Price: Call for price.
Photo:   STS Multiplex ICP ASE
Product Information:

Surface Technology Systems Multiplex ICP Advanced Silicon Etcher (ASE).

The STS Mesc Multiplex Advanced Silicon Etcher (ASE®) is an anisotropic deep silicon etching system. Perfect for Micro and Nanotechnology Laboratories undertaking semiconductor, nanotechnology, and biotechnology research. The tool is set-up to etch 4” silicon wafers, or piece-parts mounted to 4” silicon wafers or alumina sample carriers. The tool can also handle 6” wafers, but will only properly etch the center 4”.

This system ran low quantity of wafers in application lab. Never in production. Loader runs in automatic mode/ manual mode.


  • ICP high rate advanced silicon etch (ASE) with MAC carousel loader
  • BOS process
  • SOI option
  • High rate ASE chamber option
  • Silicon etch rate 8um/min
  • Load lock
  • Single Multiplex ICP process chamber
  • 3Kw 13.56Mhz Rf supply and automatch network
  • 1Kw 13.56Mhz power supply
  • Edwards IQDP80 dry pump
  • Full documentation.

Price: $379,000 USD

(sells for $00,000 new)

Does not include chemicals and/or consumables.

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